CMOS Image Sensor and Method for Manufacturing the Same

ABSTRACT

A CMOS image sensor and a method for manufacturing the same are provided. The CMOS image sensor enlarges an area of a real image and prevents interference between adjacent pixels by forming a plurality of microlenses on a convex surface and forming a light blocking layer in the space between each of color filters. The CMOS image sensor can include photodiodes, a first planarization layer, R, G, B color filter layers, a second planarization layer having holes filled with a light blocking layer, and a plurality of microlenses.

RELATED APPLICATION(S)

This application claims the benefit under 35 U.S.C. §119(e) of KoreanPatent Application No. 10-2005-0133167 filed Dec. 29, 2005, which isincorporated herein by reference in its entirety.

FIELD OF THE INVENTION

The present invention relates to an image sensor, and more particularly,to a CMOS image sensor enlarging an area of a real image that can becaptured, and a method for manufacturing the same.

BACKGROUND OF THE INVENTION

Generally, an image sensor is a semiconductor device for converting anoptical image into an electrical signal, and is largely classified as acharge coupled device (CCD) image sensor or a complementary metal oxidesemiconductor (CMOS) image sensor.

The CMOS image sensor includes a photodiode unit for detecting incidentlight, and a CMOS logic circuit for generating data by processing thedetected light into an electric signal. As the amount of light receivedin the photodiode increases, the photosensitivity of the image sensorimproves.

In order to improve photosensitivity of an image sensor, one method usesa technology for increasing the ratio (a fill factor) of the areaoccupied by a photodiode to the total area of the image sensor; andanother method uses a light condensing technology, which changes anoptical path of light incident on an area outside a photodiode in orderto condense the light into the photodiode.

A typical example of a light condensing technology is to formmicrolenses. According to this technology, the microlenses are formed ofa material having excellent light transmittance on an upper surface of aphotodiode. The microlens is formed in a convex shape. This is torefract a path of the incident light such that a larger amount of lightis projected into a photodiode region.

Hereinafter, a related art CMOS image sensor is described with referenceto FIG. 1.

FIG. 1 is a sectional view of the related art CMOS image sensor.

The related art CMOS sensor, as illustrated in FIG. 1, includesphotodiodes 12, a first planarization layer 13, red (R), green (G), andblue (B) color filter layers 14, a second planarization layer 15, and amicrolens 16. In particular, at least one photodiode 12 is formed in thesurface of a semiconductor substrate 11 to generate electric chargesaccording to an amount of incident light. The first planarization layer13 is formed on an entire surface of the semiconductor substrate 11including photodiodes 12. The R, G, B color filter layers 14 are formedon the first planarization layer 13 to transmit light in each specificwavelength range. The color filter layers 14 are formed with apredetermined interval between each color filter. The secondplanarization layer 15 is formed on an entire surface of thesemiconductor substrate 11 having the R, G, B color filter layers 14.The microlens is formed on the second planarization layer 15 in a convexshape having a predetermined curvature to condense light that transmitsto a corresponding R, G, B color filter 14.

Here, the microlens 16 is formed of polymer-based resin, and shaped tohave the predetermined curvature and size by first patterning thepolymer-based resin through deposition, exposure, and developmentprocess, and then reflowing the patterned polymer-based resin by aprocess such as a reflow process.

That is, the optimized size, thickness, and curvature diameter of themicrolens 16 are determined by the size, position, and shape of a unitpixel, the thickness of the photosensitive device, and the height,position, and size of a light blocking layer.

At this point, a shape of the pattern profile may change according toexposure conditions.

For example, process progressing conditions may change according to athin film condition in a semiconductor substrate. In reality, thepattern formation condition is very unstable, thereby deterioratinglight condensing efficiency.

The microlens 16 is formed to increase the light condensing efficiencyin a process for manufacturing the related art CMOS image sensor. Themicrolens 16 is a very important factor determining image sensorcharacteristics.

The microlens 16 serves to condense a larger amount of light into thephotodiode 12 through each color filter layer 14 according to awavelength when natural light is projected onto the image sensor.

The light incident to the image sensor is condensed by the microlens 16,and the light filtered through the color filter layers 14 is incidentinto the photodiode 12 corresponding to the color filter layers 14 belowthe photodiode 12.

The related art CMOS image sensor has a following problem.

That is, since the color filter layers 14 have respective differentthickness according to the filter color type, height difference occurs.To resolve this problem, the thickness of the second planarization layer15 is formed to be more than half of the thickness of the color filterlayer after forming the color filter layers 14.

Since the microlens is formed on the second planarization layer 15having a plane shape, the range of a real image that can be captured islimited.

Additionally, light may be incident into adjacent pixels through thecolor filter layers 14 having a predetermined interval therebetween.Therefore, crosstalk may occur and image sensor characteristics maydeteriorate.

BRIEF SUMMARY

Accordingly, embodiments of the present invention are directed to a CMOSimage sensor and a method for manufacturing the same that substantiallyobviates one or more problems due to limitations and/or disadvantages ofthe related art.

An object of embodiments of the present invention is to provide a CMOSimage sensor enlarging an area of a real image and preventinginterference between adjacent pixels, and a method for manufacturing thesame.

Another object of embodiments of the present invention is to provide amicrolens formed on a convex shaped planarization layer.

Additional advantages, objects, and features of the invention will beset forth in part in the description which follows and in part willbecome apparent to those having ordinary skill in the art uponexamination of the following or may be learned from practice of theinvention. The objectives and other advantages of the invention may berealized and attained by the structure particularly pointed out in thewritten description and claims hereof as well as the appended drawings.

To achieve these objects and other advantages and in accordance with thepurpose of the invention, as embodied and broadly described herein,there is provided a complementary metal oxide semiconductor image sensorincluding: a plurality of photodiodes formed in the surface of asemiconductor substrate; a first planarization layer formed on theentire surface of the semiconductor substrate having the photodiodes;color filter layers formed on the first planarization layercorresponding to each of the photodiodes, the color filter layers beingspaced apart from each other by a predetermined interval; a secondplanarization layer formed in a convex shape on the entire surface ofthe semiconductor substrate having the color filter layers; and aplurality of microlenses formed on the second planarization layer tocorrespond to the color filter layers.

In another aspect of the present invention, there is provided a methodof manufacturing a complementary metal oxide semiconductor image sensor,the method including: forming a first planarization layer on asemiconductor substrate having a plurality of photodiodes; forming colorfilter layers on the first planarization layer to correspond to thephotodiodes, the color filter layers being spaced apart from each otherby a predetermined interval; forming a second planarization layer on theentire surface of the semiconductor substrate having the color filterlayers; shaping a surface of the second planarization layer to a convexform; forming a hole by selectively removing the second planarizationlayer to expose space between each of the color filter layers; forming alight blocking layer by filling the hole with a light blocking material;and forming a plurality of microlenses on the convex shaped secondplanarization layer with the light blocking layer, each microlenscorresponding to one of the color filter layers.

It is to be understood that both the foregoing general description andthe following detailed description of the present invention areexemplary and explanatory and are intended to provide furtherexplanation of the invention as claimed.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings, which are included to provide a furtherunderstanding of the invention and are incorporated in and constitute apart of this application, illustrate embodiment(s) of the invention andtogether with the description serve to explain the principle of theinvention. In the drawings:

FIG. 1 is a sectional view of a related art CMOS image sensor;

FIG. 2 is a sectional view of a CMOS image sensor according to a firstembodiment of the present invention;

FIGS. 3A to 3F are sectional views illustrating a method formanufacturing a CMOS image sensor according to an embodiment of thepresent invention; and

FIG. 4 is a sectional view of a CMOS image sensor according to a secondembodiment of the present invention.

DETAILED DESCRIPTION OF THE INVENTION

Reference will now be made in detail to the preferred embodiments of thepresent invention, examples of which are illustrated in the accompanyingdrawings.

FIG. 2 is a sectional view of a CMOS image sensor according to a firstembodiment of the present invention.

Referring to FIG. 2, the CMOS image sensor includes photodiodes 102, afirst planarization layer 103, R, G, B color filter layers 104, 105, and106, a second planarization layer 107, a hole 108filled with a lightblocking layer 109, and a plurality of microlenses 110. In a specificembodiment, at least one photodiode 102 can be formed in the surface ofa semiconductor substrate 101 to generate electric charges according toan amount of incident light. The first planarization layer 103 can beformed on an entire surface of the semiconductor substrate 101 havingthe photodiodes 102. The R, G, B color filter layers 104, 105, and 106can be formed on the first planarization layer 103 to correspond to eachof the photodiodes 102. The color filter layers 104, 105, and 106 can bespaced apart from each other by a predetermined interval. The secondplanarization layer 107 can be formed in a convex shape on thesemiconductor substrate 101 having the R, G, B color filter layers 104,105, and 106. The hole 108 can be formed in the second planarizationlayer 107 to expose a predetermined portion between each of the colorfilter layers 104, 105, and 106. The light blocking layer 109 can beformed of an opaque metal filling the hole 108. The plurality ofmicrolenses can be formed on the second planarization layer 107, each ina convex shape having a predetermined curvature to correspond to each ofthe R, G, B color filter layers 104, 105, and 106.

As illustrated in FIG. 2, the plurality of microlenses 110 is formed onthe convex second planarization layer 107.

A method for manufacturing the CMOS image sensor illustrated in FIG. 2will be described in detail with reference to FIGS. 3A to 3F.

FIGS. 3A to 3F are sectional views illustrating a method formanufacturing a CMOS image sensor according to an embodiment of thepresent invention.

Referring to FIG. 3A, a plurality of photodiodes 102 can be formed inthe surface of a semiconductor substrate 101 for generating electriccharges according to an amount of incident light. An inter-layerinsulation layer (not shown) and a first planarization layer 103 can beformed on entire surface of the semiconductor substrate 101 having thephotodiodes 102.

In one embodiment, the inter-layer insulation layer can be amulti-layer. Although not shown in the figures, after forming oneinter-layer insulation layer, a light blocking layer can be formed toprevent light from being incident into a portion not having the intendedphotodiode 102, and then another inter-layer insulation layer can beformed thereupon.

Next, referring to FIG. 3B, a blue color filter layer 104 can be formedby applying a resist for a blue color filter on the first planarizationlayer 103, and then performing exposure and development processes.

A green color filter layer 105 can be formed by applying a resist for agreen color filter on the semiconductor substrate 101 having the bluecolor filter layer 104, and performing exposure and developmentprocesses. Here, the green color filter layer 105 and the blue colorfilter layer 104 have a predetermined interval therebetween.

Then, a red color filter layer can be formed by applying a resist for ared color filter on the semiconductor substrate 101 having the blue andgreen color filters 104 and 105, and performing exposure and developmentprocesses. Here, a predetermined interval between the blue, green, redcolor filter layers 104, 105, and 106 is formed.

The blue color filter layer 104, the green color filter layer 105, andthe red color filter layer 106 are sequentially formed in the embodimentdescribed above. However, embodiments of the present invention are notlimited to this order such that the formation order of each of the colorfilter layers 104, 105, and 106 can be arbitrarily adjusted.

Next, as illustrated in FIG. 3C, a second planarization layer 107 can beformed to adjust the focal length and to form a lens layer on thesemiconductor substrate 101 having color filter layers 104, 105, and106.

In an embodiment, a second planarization layer 107 can be formed, and aphotosensitive layer (not shown) can be applied on the secondplanarization layer 107. Then, exposure and developing processes can beperformed for patterning the photosensitive layer.

Next, the patterned photosensitive layer can be reflowed at apredetermined temperature to have a convex rounding surface. In aspecific embodiment, the predetermined temperature can be 150˜200° C.

The convex rounded photosensitive layer and the second planarizationlayer 107 can be etched using a 1:1 etching selectivity such that thesurface of the second planarization layer 107 is formed having a convexshape.

Next, as illustrated in FIG. 3D, the convex shaped second planarizationlayer 107 can be selectively removed to form a hole 108. The hole 8 canexpose the spaces between the color filters 104, 105, and 106.

That is, space between each of color filters 104, 105, and 106 iscompletely opened by the hole 108.

Next, as illustrated in FIG. 3E, an opaque metal can be deposited on anentire surface of the semiconductor substrate 101 having the hole 108.

Next, an etch-back can be performed to make metal deposited inside thehole 108 remain while removing the metal on a surface of the substrate.In another embodiment, a chemical mechanical polishing (CMP) process canbe used. The metal remaining inside the hole 108 serves as a lightblocking layer 109.

Here, the light blocking layer 109 may be formed to completely seal thehole 108 between each of the color filters 104, 105, and 106.

Next, as illustrated in FIG. 3F, a material layer for forming microlenscan be applied on the entire surface of the semiconductor substrate 101,and then exposure and developing processes can be performed to form amicrolens pattern.

In a specific embodiment, the material layer for forming microlens canbe a resist or an oxide layer such as Tetra Ethyl Ortho Silicate (TEOS).

Then, the microlens pattern can be reflowed at a temperature of 150 to300° C. to form the microlens 110.

In a specific embodiment, the reflow process may be performed by using ahot plate or furnace.

Then, the microlens 110 can be hardened by projecting ultraviolet raysonto its surface.

FIG. 4 is a sectional view of a CMOS image sensor according to a secondembodiment of the present invention.

The second embodiment can be identical to the first embodiment exceptthat the light blocking layer is not formed in the second embodiment.

Referring to FIG. 4, the CMOS image sensor can include photodiodes 102,a first planarization layer 103, R, G, B color filter layers 104, 105,and 106, a second planarization layer 107, and a plurality ofmicrolenses 110. In particular, at least one photodiode 102 can beformed in the surface of a semiconductor substrate 101 to generateelectric charges according to an amount of incident light. The firstplanarization layer 103 can be formed on the entire surface of thesemiconductor substrate 101 having the photodiodes 102. The R, G, Bcolor filter layers 104, 105, and 106 can be formed on the firstplanarization layer 103 to correspond to each of photodiodes 102. Thesecond planarization layer 107 can be formed in a convex form on theentire surface of the semiconductor substrate 101 having the R, G, Bcolor filter layer 14. The plurality of microlenses can be formed on thesecond planarization layer 107 to correspond to each of the R, G, Bcolor filter layers 104, 105, and 106.

Similar to the first embodiment, the diameter of the microlens 110 shownin the second embodiment becomes longer as compared to the related artplane surfaced second planarization layer 107 by forming the secondplanarization layer 107 to have a convex surface. When the diameter ofthe microlens 110 increases, an area of real image that can be capturedincreases.

A method for manufacturing the CMOS image sensor according to the secondembodiment can be identical to that of the first embodiment except forthe process of forming the hole and the light blocking layer describedin the first embodiment.

As described above, the area of a real image that can be capturedincreases as compared to the related art microlens formed on the planesurfaced second planarization layer by forming the microlens 110 on aconvex surfaced second planarization layer 107 (i.e., the value a shownin FIG. 4 increases as compared to the related art).

Additionally, noise due to natural light can be prevented by forming thelight blocking layer 109 between each of the color filters 104, 105, and106. As a result, sensitivity characteristics of the image sensor can beimproved

It will be apparent to those skilled in the art that variousmodifications and variations can be made in the present invention.

Thus, it is intended that the present invention covers the modificationsand variations of this invention provided they come within the scope ofthe appended claims and their equivalents.

1. A complementary metal oxide semiconductor (CMOS) image sensorcomprising: a plurality of photodiodes formed in the surface of asemiconductor substrate; a first planarization layer formed on thesemiconductor substrate having the photodiodes; color filter layersformed on the first planarization layer corresponding to the pluralityof photodiodes, the color filter layers being spaced apart from eachother by a predetermined interval; a second planarization layer formedin a convex shape on the semiconductor substrate having the color filterlayers; and a plurality of microlenses formed on the secondplanarization layer corresponding to the color filter layers.
 2. TheCMOS image sensor according to claim 1, further comprising a lightblocking layer formed between each of the color filter layers.
 3. TheCMOS image sensor according to claim 2, wherein the light blocking layeris formed of opaque metal.
 4. A method of manufacturing a complementarymetal oxide semiconductor image sensor, the method comprising: forming afirst planarization layer on a semiconductor substrate having aplurality of photodiodes; forming color filter layers on the firstplanarization layer corresponding to the plurality of photodiodes, thecolor filter layers being spaced apart from each other by apredetermined interval; forming a second planarization layer on thecolor filter layers; shaping a surface of the second planarization layerto a convex form; forming holes by selectively removing a portion of thesecond planarization layer to expose space between each of the colorfilter layers; forming a light blocking layer by filling the holes witha light blocking material; and forming a plurality of microlenses on theconvex shaped second planarization layer having the light blocking layercorresponding to the color filter layers.
 5. The method according toclaim 4, wherein shaping a surface of the second planarization layer toa convex form comprises; applying a photosensitive layer on the secondplanarization layer and selectively patterning the photosensitive layer;reflowing the patterned photosensitive layer to form a convex shapedphotosensitive layer; and etching the photosensitive layer and thesecond planarization layer using 1:1 etching selectivity.
 6. The methodaccording to claim 4, wherein the light blocking material is formed ofopaque metal.
 7. The method according to claim 4, further comprisingprojecting ultraviolet rays on the microlenses for hardening.
 8. Amethod of manufacturing a complementary metal oxide semiconductor imagesensor, the method comprising: forming a first planarization layer on asemiconductor substrate having a plurality of photodiodes; forming colorfilter layers on the first planarization layer corresponding to theplurality of photodiodes, the color filter layers being spaced apartfrom each other by a predetermined interval; forming a secondplanarization layer on the color filter layers; shaping a surface of thesecond planarization layer to a convex form; and forming a plurality ofmicrolenses on the convex shaped second planarization layercorresponding to the color filter layers.